发明名称 EXTREME ULTRAVIOLET LIGHT SOURCE, METHOD FOR CONTROLLING EXTREME ULTRAVIOLET LIGHT SOURCE, AND RECORDING MEDIUM IN WHICH PROGRAM THEREFOR IS RECORDED
摘要 <p>Provided is an extreme ultraviolet (EUV) light source (100) which irradiates a droplet (13) as a target substance with a laser pulse light (L1) from a driver laser (1), changes the droplet (13) into plasma, and outputs an EUV light (L10) radiated from the droplet (13) that has been changed into plasma. An EUV light source controller (C) is provided with a burst control unit (C1) which irradiates the droplet (13) with the laser pulse light (L1) that has been continuously output from the driver laser (1) in the case where the EUV light (L10) is continuously emitted, and in the case where the continuous emission is stopped, performs control so as to prevent the droplet (13) from changing into plasma by the laser pulse light (L1) while causing the driver laser (1) to continuously output the laser pulse light (L1).</p>
申请公布号 WO2011013779(A1) 申请公布日期 2011.02.03
申请号 WO2010JP62854 申请日期 2010.07.29
申请人 KOMATSU LTD.;GIGAPHOTON INC.;MORIYA, MASATO;HAYASHI, HIDEYUKI;ABE, TOORU 发明人 MORIYA, MASATO;HAYASHI, HIDEYUKI;ABE, TOORU
分类号 H05G2/00 主分类号 H05G2/00
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