发明名称 |
Aqueous cleaning composition and method for using same |
摘要 |
An aqueous-based composition and method comprising same for removing residues such as without limitation post-ashed and/or post-etched photoresist from a substrate is described herein. In one aspect, there is provided a composition for removing residues comprising: water; at least one selected from a hydroxylamine, a hydroxylamine salt compound, and mixtures thereof; and a corrosion inhibitor wherein the composition is substantially free of an added organic solvent and provided that the corrosion inhibitor does not contain a water soluble organic acid.
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申请公布号 |
US7879782(B2) |
申请公布日期 |
2011.02.01 |
申请号 |
US20050249207 |
申请日期 |
2005.10.13 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
WU AIPING;ROVITO ROBERTO JOHN |
分类号 |
C11D7/32 |
主分类号 |
C11D7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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