发明名称 |
Memory cell with memory element contacting an inverted T-shaped bottom electrode |
摘要 |
Memory cells are described along with methods for manufacturing. A memory cell described herein includes a bottom electrode comprising a base portion and a pillar portion on the base portion, the pillar portion having a top surface and a width less than that of the base portion. A memory element is on the top surface of the pillar portion and comprises memory material having at least two solid phases. A top electrode is on the memory element.
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申请公布号 |
US7879643(B2) |
申请公布日期 |
2011.02.01 |
申请号 |
US20080016840 |
申请日期 |
2008.01.18 |
申请人 |
MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
LUNG HSIANG-LAN |
分类号 |
H01L21/00;H01L21/336 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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