发明名称 Memory cell with memory element contacting an inverted T-shaped bottom electrode
摘要 Memory cells are described along with methods for manufacturing. A memory cell described herein includes a bottom electrode comprising a base portion and a pillar portion on the base portion, the pillar portion having a top surface and a width less than that of the base portion. A memory element is on the top surface of the pillar portion and comprises memory material having at least two solid phases. A top electrode is on the memory element.
申请公布号 US7879643(B2) 申请公布日期 2011.02.01
申请号 US20080016840 申请日期 2008.01.18
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 LUNG HSIANG-LAN
分类号 H01L21/00;H01L21/336 主分类号 H01L21/00
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