发明名称 |
EXPOSURE PROCESSING METHOD, EXPOSURE DEVICE USING THE SAME, EXPOSURE PROCESSING SYSTEM, METHOD FOR MANUFACTURING DEVICE, INFORMATION PROCESSOR AND EXPOSURE PROCESSING PROGRAM |
摘要 |
PROBLEM TO BE SOLVED: To calculate the synchronising accuracy of a shot region on a substrate in both scan directions without interrupting a scanning/exposing processing.SOLUTION: An exposure processing method in which a plurality of regions configuring an array defined on a substrate is exposed by synchronously moving a reticle stage holding an original plate and a wafer stage holding a substrate in a predetermined scanning direction, includes an extracting step S1 for extracting device information to be obtained through an exposure processing in a plurality of regions; and a calculating step S4, S5 for calculating interpolating value for interpolating device information in a region synchronously moved in a second scanning direction based on device information in a region synchronously moved in a first scanning direction. |
申请公布号 |
JP2011018862(A) |
申请公布日期 |
2011.01.27 |
申请号 |
JP20090164257 |
申请日期 |
2009.07.10 |
申请人 |
CANON INC |
发明人 |
ITAI DAISUKE;OZAWA KUNITAKA;FUJIWARA HIROAKI;KAWAUCHI YOSHIHIRO;NAKAGAWA HISAO;NAKAMURA HAJIME;MASUDA MITSUHIRO |
分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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