EXPOSURE APPARATUS AND EXPOSURE METHOD, AS WELL AS METHOD OF MANUFACTURING DEVICE EMPLOYING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method which reduce the time for change of reticles as well as the time for measurement and correction for performing exposure with high accuracy.SOLUTION: The exposure apparatus 1 has an original plate stage 4 for placing and holding an original plate 3 and at least two substrate stages 7 and 8 for placing and holding substrates 6 and performs multiple exposure to the substrates 6 with a pattern of the original plate 3. It further has a controller 9 for controlling operations of the original stage 4 and the substrate stages 7 and 8 and the exposure process. The controller 9 performs projection and transfer of a pattern of a first original plate to a first substrate which is placed on the first substrate stage 7 positioned at an exposure processing unit. Then it moves the substrate stages 7 and 8 for changing the substrates 6 and performs projection and transfer of the pattern of the first original plate to a second substrate which is placed on the second substrate stage 8. When it further changes original plates 3 to be used for projection and transfer from the first original plate to the second original plate, it performs projection and transfer to the same substrate 6 which is placed on the same substrate stage before and after changing the original plate 3.