SPUTTERING SYSTEM AND DEVICE FOR MANUFACTURING LIQUID CRYSTAL DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a sputtering system which can increase the efficiency of a maintenance operation such as a target exchange.SOLUTION: The opposing target type sputtering system 1 is provided with: a film deposition chamber 2 having a substrate holder 6 holding a substrate W so as to be conveyable; and a sputtering particle release part 3 communicated with the film deposition chamber 2. Wherein, a pair of targets 11, 12 are arranged so as to be confronted with at the inside of a casing 10. A part of one side of the casing 10 disposed with the secondary target 12 includes the second target 12 and is formed freely removably.