METHOD AND SYSTEM FOR THIN FILM DEPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a method and a system for thin film deposition by which an organic hard coating film and an optical thin film can be continuously deposited by a simplified process consisting of a dry process alone without breaking vacuum. SOLUTION: In the thin film deposition method, the organic hard coating film having a hardness higher than that of a plastic substrate 6a is deposited onto the substrate 6a. In this method, the following steps are carried out in succession: a step for substrate introduction into vacuum chamber where the substrate 6a is introduced into a vacuum chamber S2; a vacuum deposition step where organic matter is deposited onto the substrate 6a by performing vapor deposition in vacuum in the vacuum chamber S2 to deposit the hard coating film; a hardening step where the hard coating film is hardened simultaneously with or successively to the above vacuum deposition step; and a substrate discharge step where the substrate 6a is taken from the above vacuum chamber S2 into the air.