| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a composite substrate that constitutes a membrane structure without etching removal by providing a sacrifice layer.SOLUTION: The method for manufacturing the composite substrate includes: a pattern formation processes (S11-S13); an ion implantation process (S14); a bonding process (S15); and a separation process (S16). In the pattern formation process, a support part 2 is pattern-formed on the principal plane of a support substrate 3. The support part 2 projects from the principal plane of the support substrate 3. In the ion implantation process (S14), ion is implanted to the flat surface of a piezoelectric substrate 1. In the bonding process (S14), the support substrate 3 is bonded to the flat surface of the piezoelectric substrate 1 using the support part 2. In the separation process (S15), a micro cavity is grown up inside a fixed distance from the flat surface of the piezoelectric substrate 1, and a piezoelectric thin film 4 is separated from the piezoelectric substrate 1 bonded to the support part 2. |
