| 摘要 |
PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation-sensitive resin composition that is satisfactory with respect to high sensitivity, high resolution of a dense pattern and an isolated line, sufficient exposure latitude, proper line width roughness, proper bridge margin and high resolution of isolated space, and to provide a method for forming a pattern using the composition.SOLUTION: The actinic-ray- or radiation-sensitive resin composition includes a resin (A), whose solubility in an alkali developer is increased by the action of an acid; the resin containing a monocyclic acid-dissociable cycloalkyl (meth)acrylate unit having 5 to 8 carbon atoms and a substituted styrene unit; and a compound (B) which, when exposed to actinic rays or radiation, generates sulfonic acid having a structure of an aromatic ring that has a substituent, including a hydrocarbon group having 3 or more carbon atoms. |
