| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and apparatus for processing a substrate for removing photoresist on the substrate.SOLUTION: The method for processing a substrate includes steps of: arranging a substrate formed with a photoresist film; providing a processing liquid for removing the photoresist film onto the substrate; and providing mist on the substrate to contact the processing liquid. Since the mist reacts with the processing liquid to additionally form a hydroxide radical and, since the mist and the processing liquid perform heat generation reaction, the efficiency in removal of the photoresist can be improved. |
