发明名称 POINT OF USE RECYCLING SYSTEM FOR CMP SLURRY
摘要 The present invention generally relates to apparatus and method for recycling both polishing slurry and rinse water from CMP processes. The present invention also relates to rheology measurements and agglomeration prevention using centrifugal pumps.
申请公布号 WO2010111291(A3) 申请公布日期 2011.01.20
申请号 WO2010US28346 申请日期 2010.03.23
申请人 APPLIED MATERIALS, INC.;NEUBER, ANDREAS;CHANDLER, PHIL;STOW, CLIFF;CLARK, DANIEL O.;KIEFER, MICHAEL;LEIGHTON, JAMIE 发明人 NEUBER, ANDREAS;CHANDLER, PHIL;STOW, CLIFF;CLARK, DANIEL O.;KIEFER, MICHAEL;LEIGHTON, JAMIE
分类号 H01L21/304;H01L21/00 主分类号 H01L21/304
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