<p>Provided is a vacuum vapor deposition apparatus in which a crucible (3) as a container for vaporizing a vapor deposition material (2) is placed inside a vacuum chamber (1) and a film is formed on a substrate (4) by use of the vapor deposition material (2) vaporized in the crucible (3). The apparatus includes measuring means for measuring a bulk of the vapor deposition material (2) in the crucible (3) from an outside of the vacuum chamber (1).</p>
