发明名称 |
RRAM CELL HAVING INSERTION LAYER WITH PRAM MATERIAL AND RRAM ARRAY USING THE SAME |
摘要 |
<p>PURPOSE: A resistive-random-access-memory(RRAM) including a phase-change-random-access-memory(PRAM) material layer as an insertion layer and the RRAM array using the same are provided to improve the integrity of the RRAM using the PRAM material layer for operating a conduction route. CONSTITUTION: One or more PRAM material layers(42) are interposed in RRAM material layers(22, 24) as insertion layers. Surrounding electrodes(32, 34) are formed on both sides of each PRAM material layer. Either of surrounding electrodes includes a protrusion part. The protrusion part protruded toward a neighboring RRAM material layer. Each PRAM material layer opens and closes a conduction route.</p> |
申请公布号 |
KR20110005157(A) |
申请公布日期 |
2011.01.17 |
申请号 |
KR20090062719 |
申请日期 |
2009.07.09 |
申请人 |
SNU R&DB FOUNDATION |
发明人 |
PARK, BYUNG GOOK;RYOO, KYUNG CHANG |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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