| 摘要 |
PURPOSE: The chemical vapor deposition apparatus of a semiconductor substrate is provided to uniformly form a deposition film on a plurality of substrates loaded on a boat by differently controlling the amount of spray according to the locations of spraying holes. CONSTITUTION: A tube secures a space in which a deposition process is implemented using a source gas. An exhaust hole(125) is formed at one side of the tube in order to exhaust a remained gas. A heating chamber heats the tube with high temperature. Substrates are loaded on each slot of a boat(140). Injector sprays the source gas toward the substrates on the boat through a plurality of spraying holes.
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