METHOD FOR MANUFACTURING RESIST PATTERN AND RESIST PATTERN OBTAINED FROM THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a resist pattern capable of further improving CD uniformity and mask error factor.SOLUTION: The method for manufacturing a resist pattern includes: a step of forming a resist film by applying a resist composition containing a resin (A) which becomes alkali-soluble by the action of an acid and an acid generator (B) onto a substrate; a step of prebaking (PB) the resist film at a temperature T; a step of exposing the prebaked resist film; a step of subjecting the exposed resist film to post exposure bake (PEB) at a temperature T; and a step of obtaining a resist pattern by developing the resist film subjected to the post exposure bake with an alkali developer, wherein the expressions: 85°C