发明名称 |
THIN-FILM TRANSISTOR, METHOD OF MANUFACTURING THIN-FILM TRANSISTOR, AND DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film transistor for surely preventing fluctuation of oxygen content in a semiconductor layer comprising oxide and characteristic fluctuation due to moisture adsorption, along with its manufacturing method.SOLUTION: The thin-film transistor includes an oxide semiconductor layer 7 comprising oxide which is provided on a substrate 1, and an upper layer insulating film 9 which is formed continuously from the oxide semiconductor layer 7, on the oxide semiconductor layer 7. The outer peripheral edges of the oxide semiconductor layer 7 and the upper layer insulating film 9 are arranged to keep intervals d1-d4 of 13 μm or more from a channel region 7ch formed in the oxide semiconductor layer 7. By this configuration, the effect of moisture adsorption and entrance/leaving of oxygen from the outside of outer peripheral edge is prevented from affecting the channel region 7ch. |
申请公布号 |
JP2011009393(A) |
申请公布日期 |
2011.01.13 |
申请号 |
JP20090150446 |
申请日期 |
2009.06.25 |
申请人 |
SONY CORP |
发明人 |
MIYASHITA HIROKO;TANIGUCHI OSAMU;YAMAGUCHI NORIHIKO |
分类号 |
H01L29/786;G02F1/1368;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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