发明名称 THIN-FILM TRANSISTOR, METHOD OF MANUFACTURING THIN-FILM TRANSISTOR, AND DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a thin-film transistor for surely preventing fluctuation of oxygen content in a semiconductor layer comprising oxide and characteristic fluctuation due to moisture adsorption, along with its manufacturing method.SOLUTION: The thin-film transistor includes an oxide semiconductor layer 7 comprising oxide which is provided on a substrate 1, and an upper layer insulating film 9 which is formed continuously from the oxide semiconductor layer 7, on the oxide semiconductor layer 7. The outer peripheral edges of the oxide semiconductor layer 7 and the upper layer insulating film 9 are arranged to keep intervals d1-d4 of 13 μm or more from a channel region 7ch formed in the oxide semiconductor layer 7. By this configuration, the effect of moisture adsorption and entrance/leaving of oxygen from the outside of outer peripheral edge is prevented from affecting the channel region 7ch.
申请公布号 JP2011009393(A) 申请公布日期 2011.01.13
申请号 JP20090150446 申请日期 2009.06.25
申请人 SONY CORP 发明人 MIYASHITA HIROKO;TANIGUCHI OSAMU;YAMAGUCHI NORIHIKO
分类号 H01L29/786;G02F1/1368;H01L21/336 主分类号 H01L29/786
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