| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad that is suitable, especially, for polishing of a notch part and its peripheral part, and has a long product lifetime.SOLUTION: The polishing pad 1 is formed by impregnating a base such as nonwoven fabric with a synthetic resin etc., and varying the filling factor of the resin having been impregnated with along the thickness, wherein porosity shows the filling factor having an inclined distribution from the thickness-directional outside to the thickness-directional center side of the base. |
