| 摘要 |
<p>Disclosed is a method whereby the lithographic characteristics of a composition for lithography, which comprises a copolymer for lithography, can be evaluated without preparing the composition for lithography in practice. The lithographic characteristics of a composition for lithography, which comprises a copolymer for lithography, are evaluated by a method comprising: a step for dissolving said copolymer for lithography in a solvent to give a test solution; a step for separating gel matters from said test solution; and a step for determining a change rate of composition ratio indicating the rate of the difference, which is calculated by subtracting the composition ratio of a constitutional unit in said copolymer for lithography from the composition ratio of the constitutional unit in said gel matters, to the composition ratio of the constitutional unit in said copolymer for lithography, thereby evaluating the lithographic characteristics of the composition for lithography, which comprises said copolymer for lithography, based on the change rate of the composition ratio.</p> |
