发明名称 LASER ANNEALING APPARATUS HAVING OXYGEN PARTIAL DEGASSING MODULE
摘要 PURPOSE: A laser heat processing apparatus having deoxidation module is provided to implement the reliable heat treatment process by spraying the inert gas to a substrate with uniform amount and pressure where the laser beam is irradiated on. CONSTITUTION: A laser radiation unit is installed on the outside of a reaction chamber to be positioned on the top of a quartz window(20) and irradiates the laser beam on the substrate. The inert gas chamber(80) is installed between the quartz window and the substrate. A discharging slit(71) is formed on the side of the inert gas chamber and a beam radiation slit(81) is formed on the bottom to pass the irradiated laser beam.
申请公布号 KR20110003159(A) 申请公布日期 2011.01.11
申请号 KR20090060788 申请日期 2009.07.03
申请人 AP SYSTEMS INC. 发明人 KIM, SHANG OH;LEE, KI UNG;KIM, JONG MYONG;KIM, SUNG JIN
分类号 H01L21/324 主分类号 H01L21/324
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