发明名称 |
LASER ANNEALING APPARATUS HAVING OXYGEN PARTIAL DEGASSING MODULE |
摘要 |
PURPOSE: A laser heat processing apparatus having deoxidation module is provided to implement the reliable heat treatment process by spraying the inert gas to a substrate with uniform amount and pressure where the laser beam is irradiated on. CONSTITUTION: A laser radiation unit is installed on the outside of a reaction chamber to be positioned on the top of a quartz window(20) and irradiates the laser beam on the substrate. The inert gas chamber(80) is installed between the quartz window and the substrate. A discharging slit(71) is formed on the side of the inert gas chamber and a beam radiation slit(81) is formed on the bottom to pass the irradiated laser beam.
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申请公布号 |
KR20110003159(A) |
申请公布日期 |
2011.01.11 |
申请号 |
KR20090060788 |
申请日期 |
2009.07.03 |
申请人 |
AP SYSTEMS INC. |
发明人 |
KIM, SHANG OH;LEE, KI UNG;KIM, JONG MYONG;KIM, SUNG JIN |
分类号 |
H01L21/324 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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