| 摘要 |
PURPOSE: A rapid thermal processing apparatus and a rapid thermal processing method are provided to prevent the thermal shock of a substrate by cooling when the substrate is held on a substrate holder. CONSTITUTION: A chamber provides a thermal process space of a substrate. A heater supplies heat for heating the substrate. The substrate is held in a substrate holder(150). A substrate holder support pin(160) supports a substrate holder and vertically moves the substrate holder. A substrate support pin(170) supports the substrate and vertically moves the substrate.
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