| 摘要 |
PROBLEM TO BE SOLVED: To improve the exposure processing accuracy and working speed by reducing the distance where a substrate is made to approach/separate from a photomask during exposure.SOLUTION: The exposure device includes an actuator 2 to be attached to a rim 1a in order to apply tensile force to the rim 1a of the photomask 1. The actuator 2 can tilt to a position separating from a conveyance route T of the substrate 16 parallel to the photomask 1 by operation of an air cylinder device 13. |
