METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND APPARATUS FOR FABRICATING THE SAME

摘要

PURPOSE: A method and a device for manufacturing a semiconductor device are provided to improve the productivity of the semiconductor device and reduce wafer processing time by minimizing a reticle replacement time in a DET process. CONSTITUTION: A track(10) coats a film on the surface of a semiconductor device. An exposure(20) exposes the semiconductor device coated with the film by irradiating light. A wafer storage unit(32,34) is adjacent to the exposure and stores the wafer for a preset time.