发明名称 |
DEFECT INSPECTION METHOD AND APPARATUS THEREFOR |
摘要 |
<p>In order to effectively utilize the polarization property of an inspection subject for obtaining higher inspection sensitivity, for the polarization of lighting, it is necessary to observe differences in the reflection, diffraction, and scattered light from the inspection subject because of polarization by applying light having the same elevation angle and wavelength in the same direction but different polarization. When this is performed according to conventional techniques, a plurality of measurements by changing polarizations are required to cause a prolonged inspection time period that is an important specification of inspection apparatuses. Then, a plurality of polarization states are modulated in micro areas in the lighting beam cross section, images under a plurality of polarized lighting conditions are collectively acquired by separately and simultaneously forming the scattered light from the individual micro areas in the individual pixels of a sensor, whereby inspection sensitivity and sorting and sizing accuracy are improved without reducing throughput.</p> |
申请公布号 |
WO2011001687(A1) |
申请公布日期 |
2011.01.06 |
申请号 |
WO2010JP04336 |
申请日期 |
2010.07.01 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION;TANIGUCHI, ATSUSHI;SHIBATA, YUKIHIRO;UENO, TAKETO;NAKATA, TOSHIHIKO |
发明人 |
TANIGUCHI, ATSUSHI;SHIBATA, YUKIHIRO;UENO, TAKETO;NAKATA, TOSHIHIKO |
分类号 |
G01N21/956 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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