发明名称 |
Polishing Pad, the Use Thereof and the Method for Manufacturing the Same |
摘要 |
The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a first membrane with low permeability; a two-component paste formed on the upper surface of the first membrane with low permeability for adhering the base material to the first membrane with low permeability; and a polyurethane paste formed on the lower surface of the first membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
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申请公布号 |
US2011000141(A1) |
申请公布日期 |
2011.01.06 |
申请号 |
US20100883446 |
申请日期 |
2010.09.16 |
申请人 |
SAN FANG CHEMICAL INDUSTRY CO., LTD. |
发明人 |
FENG CHUNG-CHIH;YAO I-PENG;WANG LYANG-GUNG;HUNG YUNG-CHANG |
分类号 |
B24D11/00;B24D3/00 |
主分类号 |
B24D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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