3-DIMENSION NANO STRUCTURE AND MANUFACTURING METHOD THEREOF

摘要

PURPOSE: A method for manufacturing a 3-dimensional nanostructure is provided to secure an infiltration area of electrolyte and to directly form an electrode active material on a current collector through electroless plating and sulfurization. CONSTITUTION: A method for manufacturing a 3-dimensional nanostructure comprises the steps of: etching the upper part of a current collector(110) in a nanostructure shape; forming a metal layer on the etched current collector; and forming a metal compound layer(130) on the current collector on which the metal layer is formed. The second step uses at least one of electroless plating, electrolytic plating method, sputtering and vacuum deposition.