| 摘要 |
<p>As a substrate equipped with a pattern in the form of a matrix is transported, a plurality of images, which were imaged during a fixed time interval by an imaging means that is provided with a plurality of light receiving elements arranged in a straight line in a direction roughly orthogonal to the transportation direction of the substrate, are successively processed and the position of intensity changes in the arrangement direction of the abovementioned light receiving elements are detected; the frequency of the intensity changes detected at the same position while the substrate is moved only a fixed distance is summed; a plurality of edge number data arranged in correspondence with the position of the detected intensity changes is obtained; while a template is moved, a plurality of correlation value data is obtained by calculating the correlation of the calculated edge number data; the position of a plurality of patterns is specified from the plurality of correlation value data exceeding a predetermined threshold; the position of the pattern in the proximity of the target position of the imaging means is selected from thereamong; the amount of position deviation between said pattern position and the target position of the imaging means is calculated; and a photo mask is moved in a direction roughly orthogonal to the transportation direction of the substrate in a manner such that said position deviation becomes a predetermined value.</p> |
