| 摘要 |
The invention relates to a method and an arrangement for the production of nano-imprint stamps, which can be used for the production of nano-technical structures. The aim of the invention is to provide solutions that allow the production of nano-imprint stamps with special geometric properties and thus provide further design options for nano-imprint products. Said aim is achieved according to a first aspect of the present invention by a nano-imprint stamp comprising a stamp body (K), which is made from a stamp blank by way of local material removal and that a stamp front structure, wherein said stamp front structure can be pressed into a shaping substrate in the direction of a stamp placement axis (X) in order to generate an imprint that complements the stamp front structure, wherein the stamp front structure carries a plurality of placement surfaces (S1,S2,...) that are aligned substantially transversal to the stamp placement axis (X), and wherein said placement surfaces (S1, S2,...) assume different vertical level positions (L1, L2 ) in the direction of the stamp placement axis (X). Said nano-imprint stamp is characterized in that the stamp blank is configured as a layer structure and comprises a plurality of layer boundaries (G1, G2, G3). The layer structure is designed such that the positions of the layer boundaries (G1, G2, G3) correspond to the vertical level positions (L1, L2 ) of the placement surfaces (S1, S2, ). |
