发明名称 Transistor for active matrix display and a method for producing said transistor
摘要 A transistor for active matrix display and a method for producing the transistor (1). The transistor (1) includes a microcrystalline silicon film (5) and an insulator (3). The crystalline fraction of the microcrystalline silicon film (5) is above 80%. According to the invention, the transistor (1) includes a plasma treated interface (4) located between the insulator (3) and the microcrystalline silicon film (5) so that the transistor (1) has a linear mobility equal or superior to 1.5 cm2V−1s−1, shows threshold voltage stability and wherein the microcrystalline silicon film (5) includes grains (6) whose size ranges between 10 nm and 400 nm. The invention concerns as well a display unit having a line-column matrix of pixels that are actively addressed, each pixel comprising at least a transistor as described above.
申请公布号 US7863113(B2) 申请公布日期 2011.01.04
申请号 US20040544787 申请日期 2004.02.06
申请人 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE;ECOLE POLYTECHNIQUE 发明人 ROCA I CABARROCAS PERE;VANDERHAGHEN REGIS;DREVILLON BERNARD
分类号 H01L21/00;H01L21/336;H01L29/786 主分类号 H01L21/00
代理机构 代理人
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