A COMPOSITION FOR SURFACE TREATMENT OF MOLD USED IN LITHOGRAPHY AND PRODUCING METHOD OF MOLD FOR PATTERN-FORMING

摘要

PURPOSE: A composition for surface treatment of a mold used in lithography and a method for producing the mold for pattern-forming are provided to minimize swelling and pattern defects caused by foreign materials. CONSTITUTION: A composition for surface treatment of a mold used in lithography comprises a water soluble resing and solvent. The mold includes a silicone elastomer. The silicone elastomer is polydimethylsiloxane. The silicone elastomer is selected from a compound represented by chemical formula. In chemical formula, R, R1, R2, and R3 are selected from substituted or unsubstituted C1 ~ 12 allyl group, allyl group, substituted or unsubstituted C6 ~ 30 aryl group, hydrogen, animo group and epoxy group; and n and m are an integer of 1 ~ 20.