发明名称 |
THROUGH HOLE ELECTRODE AND METHOD OF FORMING THE SAME |
摘要 |
PURPOSE: A through hole type electrode and a forming method thereof are provided to reduce the time of an electrolyte plating process by reducing the distance of an electrode growth by filling a part of a through hole with a conductive paste. CONSTITUTION: A through hole is formed in a substrate(10) by a dry etching process. A conductive paste(60) is filled in the lower part of the through hole. A metal layer(40) is formed in the bottom side of the substrate in which the conductive paste is filled. A protective layer is attached to the surface of the metal layer. An inner electrode(50) is formed in the through hole by using the metal layer as a seed layer.
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申请公布号 |
KR20100138224(A) |
申请公布日期 |
2010.12.31 |
申请号 |
KR20090056648 |
申请日期 |
2009.06.24 |
申请人 |
SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION |
发明人 |
SUH, SU JEONG;KIM, YOON SIK |
分类号 |
H05K3/42;H01L21/28 |
主分类号 |
H05K3/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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