发明名称 |
PELLICLE FRAME AND LITHOGRAPHIC PELLICLE |
摘要 |
<p>PURPOSE: A pellicle frame and a lithographic pellicle are provided to offer the pellicle frame and the lithographic pellicle capable of reducing the deformation of photomask due to the deformation of pellicle deformation. CONSTITUTION: The concave part(12) is formed on each side. The cross area of the pellicle frame bar of 1 mm^2 to 6 mm^2. The planarity of the pellicle frame is 0μm to 20μm. The area of the quadrangle is 4 mm^2 to 20 mm^2.</p> |
申请公布号 |
KR20100138820(A) |
申请公布日期 |
2010.12.31 |
申请号 |
KR20100059527 |
申请日期 |
2010.06.23 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD.;INTEL CORP. |
发明人 |
SHIRASAKI TORU;MUSHELL DAVID;CHAKRAVORTY KISHORE;NG GRACE |
分类号 |
H01L21/027;B65D85/86;G03F1/64 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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