发明名称 PELLICLE FRAME AND LITHOGRAPHIC PELLICLE
摘要 <p>PURPOSE: A pellicle frame and a lithographic pellicle are provided to offer the pellicle frame and the lithographic pellicle capable of reducing the deformation of photomask due to the deformation of pellicle deformation. CONSTITUTION: The concave part(12) is formed on each side. The cross area of the pellicle frame bar of 1 mm^2 to 6 mm^2. The planarity of the pellicle frame is 0μm to 20μm. The area of the quadrangle is 4 mm^2 to 20 mm^2.</p>
申请公布号 KR20100138820(A) 申请公布日期 2010.12.31
申请号 KR20100059527 申请日期 2010.06.23
申请人 SHIN-ETSU CHEMICAL CO., LTD.;INTEL CORP. 发明人 SHIRASAKI TORU;MUSHELL DAVID;CHAKRAVORTY KISHORE;NG GRACE
分类号 H01L21/027;B65D85/86;G03F1/64 主分类号 H01L21/027
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