发明名称 ALIGNMENT MARK
摘要 An alignment mark for defect inspection is disclosed. The alignment mark includes: a semiconductor substrate; a first type well disposed in the semiconductor substrate; a second type doping region disposed in the first type well; a dielectric layer disposed on the semiconductor substrate to cover the first type well and the second type doping region; and a plurality of conductive plugs formed in the dielectric layer for connecting to the second type doping region.
申请公布号 US2010327451(A1) 申请公布日期 2010.12.30
申请号 US20100878011 申请日期 2010.09.08
申请人 CHOU LING-CHUN;CHEN MING-TSUNG;LIU HSI-HUA;LEI SHUEN-CHENG;TSAO PO-CHAO 发明人 CHOU LING-CHUN;CHEN MING-TSUNG;LIU HSI-HUA;LEI SHUEN-CHENG;TSAO PO-CHAO
分类号 H01L23/498 主分类号 H01L23/498
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