发明名称 LOW VAPOR PRESSURE HIGH PURITY GAS DELIVERY SYSTEM
摘要 Systems, apparatuses and methods for vapor phase fluid delivery to a desired end use are provided, wherein the conditions of the system are monitored to determine when the water concentration or supply vessel surface temperature exceeds a specified value or when the low vapor pressure fluid pressure falls below a specified value for the purpose of removing a first supply vessel from service by discontinuing vapor flow from the first supply vessel and initiating vapor flow from a second supply vessel.
申请公布号 US2010326537(A1) 申请公布日期 2010.12.30
申请号 US20100877318 申请日期 2010.09.08
申请人 SARIGIANNIDIS CHRISTOS;BERGMAN JR THOMAS JOHN;JOHNSON MICHAEL CLINTON;CHAKRAVARTI SHRIKAR 发明人 SARIGIANNIDIS CHRISTOS;BERGMAN, JR. THOMAS JOHN;JOHNSON MICHAEL CLINTON;CHAKRAVARTI SHRIKAR
分类号 F15D1/00 主分类号 F15D1/00
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