发明名称 Substrate stress measuring technique
摘要 A system, including: a first current mirror having a first current, formed of multiple devices disposed on a substrate, where, when a stress is present, a behavior of a device of the multiple devices forming the first current mirror depends on a direction in which the device of the multiple devices forming the first current mirror is disposed on the substrate; a second current mirror having a second current, formed of multiple devices disposed on the substrate, where, when the stress is present, a behavior of a device of the multiple devices forming the second current mirror depends on a direction in which the device of the multiple devices forming the second current mirror is disposed on the substrate; and a device for measuring a ratio of a difference between the first current and the second current to a sum of the first current and the second current.
申请公布号 US7859328(B2) 申请公布日期 2010.12.28
申请号 US20090401611 申请日期 2009.03.10
申请人 ORACLE AMERICA, INC. 发明人 O'NEILL THOMAS G.;BOSNYAK ROBERT J.
分类号 H01L25/00 主分类号 H01L25/00
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