发明名称 Semiconductor device having a SRAM with a substrate contact and method for fabricating the same
摘要 An isolation insulating film is formed so that an active region of a first access transistor and a substrate contact region can be integrated with each other in a plan view. A dummy gate electrode is formed on the semiconductor substrate between the active region of the first access transistor and the substrate contact region. The dummy gate electrode is electrically connected to a P-type impurity region of the substrate contact region.
申请公布号 US7859058(B2) 申请公布日期 2010.12.28
申请号 US20060480909 申请日期 2006.07.06
申请人 PANASONIC CORPORATION 发明人 NAKAMURA MASAYUKI;ISHIKURA SATOSHI;YAMADA TAKAYUKI
分类号 H01L27/088 主分类号 H01L27/088
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