| 摘要 |
Disclosed are a substrate alignment apparatus precisely and automatically aligning a mask on a substrate by sequentially moving the substrate and the mask horizontally on a susceptor being driven up and down, a substrate processing apparatus including the same, and a substrate alignment method. The substrate alignment apparatus includes a position fixing unit protruding from an upper surface of the susceptor driven up and down in a chamber so as to form a reference line for alignment of the substrate and the mask, a horizontal transfer unit connected at outer surfaces of two sidewalls of the chamber and extended into the chamber to align the substrate and the mask according to the up and down movement of the susceptor until the substrate and the mask are stopped by the position fixing unit from horizontally moving, and a control unit adapted to control the susceptor and the horizontal transfer unit.
|
