发明名称 Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
摘要 In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced. <IMAGE>
申请公布号 DE602004029970(D1) 申请公布日期 2010.12.23
申请号 DE20046029970T 申请日期 2004.08.25
申请人 ASML NETHERLANDS B.V. 发明人 DIERICHS, MARCEL MATHIJS THEODORE MARIE;DONDERS, SJOERD NICOLAAS LAMBERTUS;JACOBS, JOHANNES HENRICUS WILHELMUS;JANSEN, HANS;LOOPSTRA, ERIK ROELOF;MERTENS, JEROEN JOHANNES SOPHIA MARIA;STAVENGA, MARCO KOERT;STREEFKERK, BOB;VERHAGEN, MARTINUS CORNELIS MARIA;SEUNTIENS-GRUDA, LEJLA
分类号 G03F7/20;B01D61/02;B01D61/24;C02F1/04;C02F1/28;C02F1/32;C02F1/42;C02F1/44;H01L21/027 主分类号 G03F7/20
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