发明名称 GROUP III NITRIDE SEMICONDUCTOR ELEMENT AND EPITAXIAL WAFER
摘要 <p>A primary surface 23a of a supporting base 23 of a light-emitting diode 21a tilts by an off-angle of 10 degrees or more and less than 80 degrees from the c-plane. A semiconductor stack 25a includes an active layer having an emission peak in a wavelength range from 400 nm to 550 nm. The tilt angle "A" between the (0001) plane (the reference plane S R3 shown in Fig. 5 ) of the GaN supporting base and the (0001) plane of a buffer layer 33a is 0.05 degree or more and 2 degrees or less. The tilt angle "B" between the (0001) plane of the GaN supporting base (the reference plane S R4 shown in Fig. 5 ) and the (0001) plane of a well layer 37a is 0.05 degree or more and 2 degrees or less. The tilt angles "A" and "B" are formed in respective directions opposite to each other with reference to the c-plane of the GaN supporting base.</p>
申请公布号 EP2264743(A1) 申请公布日期 2010.12.22
申请号 EP20090729983 申请日期 2009.04.03
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 YOSHIZUMI, YUSUKE;ENYA, YOHEI;UENO, MASAKI;NAKANISHI, FUMITAKE
分类号 H01L21/205;C30B29/38;H01L33/00;H01L33/06;H01L33/12;H01L33/16;H01L33/32;H01S5/343 主分类号 H01L21/205
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