| 摘要 |
PURPOSE: An ion implanter is provided to integrally implant ions by radiating an ion beam on a plurality of substrates. CONSTITUTION: An injection chamber(8) is exhausted to a vacuum. An ion beam is inputted to the injection chamber. A holder(12) is installed in the injection chamber. A holder driving unit(16) reciprocates in an X direction. First and second loadlock devices(20a,20b) provide a substrate between the injection chamber and the standby side.
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