发明名称 Reduced Process Sensitivity of Electrode-Semiconductor Rectifiers
摘要 Disclosed are semiconductor devices and methods of making semiconductor devices. An exemplary embodiment comprises a semiconductor layer of a first conductivity type having a first surface, a second surface, and a graded net doping concentration of the first conductivity type within a portion of the semiconductor layer. The graded portion is located adjacent to the top surface of the semiconductor layer, and the graded net doping concentration therein decreasing in value with distance from the top surface of the semiconductor layer. The exemplary device also comprises an electrode disposed at the first surface of the semiconductor layer and adjacent to the graded portion.
申请公布号 US2010314707(A1) 申请公布日期 2010.12.16
申请号 US20090484096 申请日期 2009.06.12
申请人 YEDINAK JOSEPH A;RINEHIMER MARK L;GREBS THOMAS E;BENJAMIN JOHN L 发明人 YEDINAK JOSEPH A.;RINEHIMER MARK L.;GREBS THOMAS E.;BENJAMIN JOHN L.
分类号 H01L29/872;H01L21/22;H01L21/33 主分类号 H01L29/872
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