发明名称 SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device and a method of manufacturing the same that prevent harmful effects due to progression of a bleed-out component in an easy manner without forming a hydrophobic film. SOLUTION: The semiconductor device includes a metal plate having a rolling flaw generated during rolling, an element fixed to the metal plate via an adhesive material, a wire connecting the metal plate and element to each other, and a groove formed by performing press working on the metal plate. Then the groove is arranged so as to stop extension of the bleed-out component of the adhesive material along the rolling flaw to a connection point between the metal plate and wire, and also the groove has deep enough to avoid strain of the metal plate and to stop the extension of the bleed-out component to the connection point. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010283066(A) 申请公布日期 2010.12.16
申请号 JP20090134121 申请日期 2009.06.03
申请人 MITSUBISHI ELECTRIC CORP 发明人 HISA YOSHIHIRO
分类号 H01L21/52;H01L23/12;H01L23/50 主分类号 H01L21/52
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