| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus in which a liquid supply operation and a liquid recovery operation for forming a liquid immersion region are performed well to form the liquid immersion region in a desired state, allowing a high exposure accuracy and a high measurement accuracy to be obtained. <P>SOLUTION: An exposure apparatus EX exposes a substrate (P) by radiating exposure light (EL) onto the substrate (P) via a liquid (LQ). The exposure apparatus has a liquid supply mechanism (10) having a supply port (13) capable of supplying the liquid (LQ) in a direction substantially parallel to the surface of the substrate (P). <P>COPYRIGHT: (C)2011,JPO&INPIT |
