发明名称 CLEANING DEVICE AND CLEANING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a cleaning device suitable for removing the deposit of flux produced in a soldering stage and a resin film such as the photoreceptor layer of an OPC drum used in an image forming apparatus or the release layer of a fixing roller, although a device has already been proposed, which removes a deposit adhering to an object to be cleaned by using a solid cleaning medium without using water nor a solvent. <P>SOLUTION: Using a flake-like cleaning medium M having greater pencil hardness than the resin film of a cleaning object and by causing the medium to fly by a high-speed air-flow and to collide with the object, the cleaning medium M bites into the film like deposit in spite of a small mass, since the film like deposit is easier to be dented and contact force is concentrated on the end of the cleaning medium M. As a result, it improves cleaning of a component of a complicated shape, removal of a film like deposit, or cleanliness of the cleaning medium, so that the cleaning quality is enhanced. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010279947(A) 申请公布日期 2010.12.16
申请号 JP20100178191 申请日期 2010.08.06
申请人 RICOH CO LTD 发明人 SATO TATSUYA;OKAMOTO YOICHI;FUCHIGAMI AKIHIRO;TANEDA YUSUKE
分类号 B08B5/02;B08B1/02;B08B5/00;B08B9/38;G03G15/00;G03G21/00 主分类号 B08B5/02
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