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发明名称
Mikrostruktur zur Bildung eines Substrats aus Silizium und Germanium auf einem Isolator und vom Typ Si1-XGeX
摘要
申请公布号
DE602007010197(D1)
申请公布日期
2010.12.16
申请号
DE200760010197T
申请日期
2007.02.13
申请人
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES
发明人
DAMLENCOURT, JEAN-FRANCOIS;COSTA, REMI
分类号
H01L21/762
主分类号
H01L21/762
代理机构
代理人
主权项
地址
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