发明名称 METHOD OF FABRICATING A ZINC OXIDE BASED NANOWIRE USING A BUFFER LAYER IN A HIGH TEMPERATURE PROCESS AND METHOD OF FABRICATING A ELECTRONIC DEVICE USING THE SAME
摘要 PURPOSE: A method for fabricating a zinc oxide-based nanowire is provided to obtain the vertical growth of a nanowire by forming a zinc oxide-based nanowire after a zinc oxide buffer layer is formed on a substrate. CONSTITUTION: A method for fabricating a zinc oxide-based nanowire forms a zinc oxide-based buffer layer(102) on a substrate(100) using a chemical vapor deposition(CVD) which is performed at a first temperature and forms a zinc oxide-based nanowire(104) on the zinc oxide-based buffer layer using a chemical vapor deposition(CVD) which is performed at a second temperature greater than the first temperature.
申请公布号 KR20100130296(A) 申请公布日期 2010.12.13
申请号 KR20090048891 申请日期 2009.06.03
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 CHO, HYUNG KOUN;KIM, DONG CHAN
分类号 B82B3/00;G09F9/00;H01J1/30;H01L21/205 主分类号 B82B3/00
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