发明名称 |
METHOD OF FABRICATING A ZINC OXIDE BASED NANOWIRE USING A BUFFER LAYER IN A HIGH TEMPERATURE PROCESS AND METHOD OF FABRICATING A ELECTRONIC DEVICE USING THE SAME |
摘要 |
PURPOSE: A method for fabricating a zinc oxide-based nanowire is provided to obtain the vertical growth of a nanowire by forming a zinc oxide-based nanowire after a zinc oxide buffer layer is formed on a substrate. CONSTITUTION: A method for fabricating a zinc oxide-based nanowire forms a zinc oxide-based buffer layer(102) on a substrate(100) using a chemical vapor deposition(CVD) which is performed at a first temperature and forms a zinc oxide-based nanowire(104) on the zinc oxide-based buffer layer using a chemical vapor deposition(CVD) which is performed at a second temperature greater than the first temperature. |
申请公布号 |
KR20100130296(A) |
申请公布日期 |
2010.12.13 |
申请号 |
KR20090048891 |
申请日期 |
2009.06.03 |
申请人 |
SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION |
发明人 |
CHO, HYUNG KOUN;KIM, DONG CHAN |
分类号 |
B82B3/00;G09F9/00;H01J1/30;H01L21/205 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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