| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a unit including a three-dimensional surface pattern, and to provide use of the same. SOLUTION: In a first processing step, a photoresist is applied to a base layer 3. A predetermined masking exposure 13 is executed to a photoresist layer 9 in a second processing step. In a third processing step, a part of the photoresist layer 9 is removed by development such that an initial surface pattern having sacrificial layer regions 25 is obtained. In a fourth processing step, coatings 29, 31 covering the initial surface pattern are applied, especially by a sputtering method, preferably as an alternating layer system. In a fifth processing step, energy is applied to the initial surface pattern in order to destabilize the sacrificial layer regions 25. In a sixth processing step, a high-pressure liquid jet 33 is made to act on the initial surface pattern at a predetermined processing temperature, whereby at least partial parts of the coatings 29 covering the sacrificial layer regions 25 are mechanically removed or at least broken off in order to provide the final surface pattern. COPYRIGHT: (C)2011,JPO&INPIT
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