METHOD OF PLANARIZING A COATING LAYER, AND METHOD OF MANUFACTURING A SUPPORTING APPARATUS

摘要

PURPOSE: A method of planarizing a coating layer and a method of manufacturing a supporting apparatus are provided to maintain the thickness of the coating layer by grinding the coating layer so that a basic material is closely contacted with a base plate. CONSTITUTION: A basic material(210) supporting a substrate is prepared. The coating layer(220) is formed on the top side of the base material. The base material is arranged on the base plate of a polishing device(100). The basic material is closely contacted with the base plate to be flat. The coating layer is ground to be flat.