发明名称 |
SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor memory device having low electric resistances in a bit-line contact and of a connection part between the bit-line contact and a source-drain region, and to provide a method for manufacturing the same. SOLUTION: The semiconductor memory device 100 includes: a semiconductor substrate 1 having an active region 2 compartmentalized by an element isolation region 3; a plurality of stacked gate type memory cell transistors formed on the active region 2 and connected in series; selection transistors formed on the active region 2 and connected to both the ends of the plurality of memory cell transistors; and bit-line contact 8 connected to a source-drain region 5 belonging to the selection transistor in the active region 2 and having a vertical sectional shape in a channel width direction of its lower part as a skirt shape. COPYRIGHT: (C)2011,JPO&INPIT
|
申请公布号 |
JP2010272638(A) |
申请公布日期 |
2010.12.02 |
申请号 |
JP20090122191 |
申请日期 |
2009.05.20 |
申请人 |
TOSHIBA CORP |
发明人 |
NAGASHIMA MASASHI;ARAI FUMITAKA;MEGURO TOSHITAKA;AKAHORI HIROSHI |
分类号 |
H01L27/115;H01L21/8247;H01L29/788;H01L29/792 |
主分类号 |
H01L27/115 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|