PLASMA PROCESSING APPARATUS AND METHOD FOR CLEANING SAME

摘要

Disclosed is a plasma processing apparatus (101) which comprises a chamber (1) for internally performing plasma processing, a remote plasma device (2) that is provided outside the chamber in order to generate radicals for cleaning the interior of the chamber (1), and a radical-introducing port (3) for discharging the radicals generated in the remote plasma device (2) toward the inside of the chamber (1). The radical-introducing port (3) is provided with a plurality of gas outlets (4) for blowing out a rectifying gas in such a manner that the rectifying gas affects the direction in which the radicals proceed in the chamber (1).