LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus with an improved optical encoder system not generating deterioration of dynamic and thermal behavior of a substrate table caused by fibers to the optical encoder system.

SOLUTION: The lithographic apparatus includes an optical encoder measurement system having a radiation system to direct a radiation beam 104 to a first scale 5. The system has an optical component 7 to direct a primary diffraction beam 9 diffracted from a first scale 5 upon radiation by the radiation beam to a second scale 11 and a detector 131 to detect a secondary diffraction beam 15 after interference and a second diffraction of the primary diffraction beam 9 on the second scale 11 to measure a position of the first scale 5 with respect the second scale 11.

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